| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1654017 | Materials Letters | 2005 | 4 Pages |
Abstract
Formation of mesoscopic and submicrometric self-assembled patterns in polystyrene and polycarbonate films produced by a fast dip-coating process was studied. Mixtures of chloroform and dichloromethane were used as a solvent. The mixture's composition plays a decisive role in the patterning. Close-packed honeycomb structures comprised of 200–2000 nm pores dispersed in polymer matrix were obtained. The mechanism of self-assembling is discussed.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Edward Bormashenko, Roman Pogreb, Oleg Stanevsky, Yelena Bormashenko, Stein Tamir, Ron Cohen, Meirav Nunberg, Vladimir-Zeev Gaisin, Maria Gorelik, O.V. Gendelman,