Deposition of crystalline C–N film by arc evaporation process

Crystalline carbon nitride thin films were deposited by Arc evaporation process. The room temperature deposited films showed amorphous and polycrystalline phases whereas, the films were crystalline, when deposited at 300 °C. These films were nano-crystalline and had grain sizes varying from 5 to 30 nm depending on the deposition condition. The average C : N at.% ratio for films deposited at 300 °C substrate temperature was found as C : N :: 39.37 : 59.87. The microhardness of the deposited films were in the range of 2200Hv.015 to 1800Hv.015.