| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1654948 | Materials Letters | 2005 | 4 Pages |
Abstract
A new humidity-resistant highly sensitive acrylamide-based photopolymeric holographic recording material has been developed. The photopolymer is resistant to the humidity of environment. Diffraction efficiencies near 50% are obtained with exposure energy of 60 mJ/cm2 in materials of 150 μm thickness. Diphenyl iodonium chloride is added to the material and can increase the exposure sensitivity by a factor of more than 4 (to about 28 mJ/cm2). An image has been successfully stored in the material with a small distortion.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Qiaoxia Gong, Sulian Wang, Mingju Huang, Fuxi Gan,