Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1657025 | Surface and Coatings Technology | 2015 | 10 Pages |
Abstract
In this paper, an amorphous carbon film containing F-Si-doped multilayer structure was developed through a simple deposition technique. The deposited film was able to attenuate stress concentrations, and improve the adhesion between film and substrate. The film had strong adhesion to substrate and could well withstand high scratch loads. Results showed superior wear resistance of film/GCr 15 pairs in 0.1Â M HCl strongly correlated with the interfacial reactions of the contacting area. A solid-like film was believed to be responsible for the excellent wear reduction of film/GCr 15 pairs in 0.1Â M HCl solution, where SiC nanocrystallines were contained. The wear mechanism was tentatively discussed according to the morphologies and chemical compositions of the debris examined by transmission electron microscope and X-ray photoelectron spectroscopy.
Related Topics
Physical Sciences and Engineering
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Nanotechnology
Authors
Renhui Zhang, Liping Wang,