Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1657297 | Surface and Coatings Technology | 2015 | 5 Pages |
Abstract
TiN/Mo2N nano-multilayer films with modulation period ranging from 3 nm to 9.8 nm were deposited by magnetron sputtering. TiN and Mo2N monolithic films were also deposited for comparison. It was found that the (200) preferred orientated TiN/Mo2N nano-multilayer films exhibited fcc structure similar to B1-NaCl and formed isostructural superlattice with well defined interfaces between TiN and Mo2N layers. The multilayer films with modulation periods λ = 3 nm and 5.7 nm exhibited superhardness with a value of about 41 GPa. Both the coefficient of friction and specific wear rate of multilayer films increased from 0.29 to 0.44 and 5.8 Ã 10â 17 m3/Nm to 1.3 Ã 10â 16 m3/Nm, respectively, with the increase of the modulation period. The TiN/Mo2N nano-multilayer films exhibited improved mechanical and tribological properties compared to TiN and Mo2N monolithic films.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Guojun Zhang, Tao Wang, Hailin Chen,