Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1657735 | Surface and Coatings Technology | 2013 | 4 Pages |
In this investigation, titanium oxide films were deposited on silicon substrate by liquid phase deposition using a deposition solution of ammonium hexafluoro-titanate and boric acid. The concentration of the boric acid in the deposition solution controls the rate of deposition of titanium oxide film. The titanium oxide film becomes superhydrophilic with a contact angle around 4° after irradiation by UV light. The average reflectance is 5.3% at wavelengths from 400 to 800 nm. Superior wetting and antireflection properties make the film suitable for use in silicon-based solar cells.
► TiO2 films were deposited on silicon substrate by liquid phase deposition. ► The LPD-TiO2 film is superhydrophilic with contact angle around 4°. ► The average reflectance of LPD-TiO2/Si structure is 5.3%. ► LPD-TiO2 film has excellent self-cleaning and antireflection properties.