Synthesis and characterization of zirconium oxynitride coatings deposited by filtered cathodic vacuum arc technology

Thin films of zirconium oxynitride (ZrOxNy) were deposited onto glass and Si substrate at room temperature by filtered cathodic vacuum arc (FCVA) technology using air as a reactive gas. The compositions and structures of the zirconium oxynitride films influenced by air flow rate were investigated by scan electronic spectroscopes, X-ray diffraction and X-ray photoelectron spectroscopes. The results showed that crystal structure of the films transformed from ZrO and ZrN mixed phases to ZrN phase with the increasing air flow rate. The hardness, elastic modulus and elastic recovery parameter (ERP) of the zirconium oxynitride films were also determined by nano indentation tests. At the optimum deposition parameters, the hardness and elastic modulus values reached 28.94 GPa and 253.44 GPa respectively; good wear resistant properties were also achieved due to the high H/E ratio (0.115) and good elastic recovery (86.18%). The optical band gap of the film at the optimum deposition parameter was 1.91 eV, implying that the film had great potentials in many photocatalytic and optoelectronic applications.

► Synthesis of ZrOxNy thin film by filtered cathodic vacuum arc technology. ► Using the air as a reactive gas can reduce the processing time. ► The mechanical property and optical band gap of the films were investigated.