| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1657873 | Surface and Coatings Technology | 2013 | 4 Pages |
We have studied the deposition of ZrNbTaTiW multi-elements alloy thin films on Si (111) substrates by multi-targets magnetron sputtering process. The chemical composition, constituent phase, grain morphology and hardness were investigated using XRF, XRD, FESEM and nano-indenter. The amorphous structure was formed in the film when the atomic percent of Zr exceeded 35%. The value of the hardness and modulus were in the range of 5.9 to 11.5 and 134.4 to190.4 GPa, respectively. Both of the structure and property of multi-elements alloy films strongly depended on the films composition.
►Multi-element alloy films were deposited by muti-targets magnetron sputtering. ►Amorphous structure has been formed when the Zr content exceeded 35 at.%. ►Structure and property of alloy film strongly depend on the film composition. ►Maximum hardness and elastic modulus of alloy films reached 11.5 and 190.4 GPa.
