Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1657875 | Surface and Coatings Technology | 2013 | 4 Pages |
Abstract
A VHF SiH4/H2 plasma was produced using a multi rod electrode and the plasma parameters were measured using a heated Langmuir probe, where the frequency of the power source was 80 MHz. The Langmuir probe characteristics indicated that when the concentration of SiH4/H2 is increased, negative ions appear and at the same time the electron temperature increases.
► VHF SiH4/H2 plasma was produced using a multi rod electrode of 422 mm × 422 mm. ► The sheath potential was lower than the calculated one for SiH4/H2 of 30%. ► The electron temperature increased to (4–4.5) eV for SiH4/H2 of 30%. ► The probe characteristics indicated the existence of negative ions for 30%.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Tsukasa Yamane, Sachiko Nakao, Yoshiaki Takeuchi, Yasuhiro Yamauchi, Hiromu Takatsuka, Hiroshi Muta, Kiichiro Uchino, Yoshinobu Kawai,