| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1657913 | Surface and Coatings Technology | 2013 | 4 Pages |
Abstract
⺠Nanocrystalline silicon films were made by pulsed-DC magnetron sputtering. ⺠Threshold working pressure and hydrogen concentration were required. ⺠High defect density due to ion bombardment and oxygen contamination caused low conductivity.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
J.S. Cherng, S.H. Chang, S.H. Hong,