| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1658410 | Surface and Coatings Technology | 2012 | 6 Pages |
Abstract
⺠In this study we investigated the phase formation in Al-Cu thin films. ⺠We characterized the samples by in-situ resistance measurements, and in-situ X-ray Diffraction. ⺠The activation energies of Al2Cu and Al4Cu9 were calculated using simulations of the XRD and resistivity results. ⺠The resistivity values of AlCu, Al2Cu3 and Al4Cu9 were determined at room temperature.
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Authors
Fanta Haidara, Marie-Christine Record, Benjamin Duployer, Dominique Mangelinck,