| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1658517 | Surface and Coatings Technology | 2012 | 8 Pages |
Abstract
⺠Comparison of plasma conditions between Hf and Ti HiPIMS depositions. ⺠HiPIMS sputtering regimes for Hf showed stronger pressure dependence compared to Ti. ⺠HiPIMS deposition promoted growth of the (100) orientation in Hf and Ti films.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
A.N. Reed, M.A. Lange, C. Muratore, J.E. Bultman, J.G. Jones, A.A. Voevodin,