| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1658605 | Surface and Coatings Technology | 2012 | 6 Pages |
Abstract
⺠ICP-assisted magnetron sputtering is developed for poly-Si films below 300 °C. ⺠Atomic hydrogen or active Si atoms is an insufficient condition. ⺠Hydrogen plasma plays the key role in the formation of poly-Si films.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Yuanjun Su, Jun Xu, Chuang Dong, Wenqi Lu,