| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1658871 | Surface and Coatings Technology | 2011 | 5 Pages |
Abstract
Based on these results, micro-patterning with various sizes in a range of 3 μm to 100 μm was performed on the Si(100) surfaces by the ethanol cluster ion irradiation. Various kinds of photo-resist mask patterns such as circle, square and line patterns were made on a Si(100) surface by photo-resist technique. The SEM observation showed that micro-patterns were prepared on the Si (100) surface by the ethanol cluster ion irradiation.
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Authors
Gikan H. Takaoka, Hiromichi Ryuto, Ryosuke Ozaki, Hiroshi Mukai, Mitsuaki Takeuchi,