| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1658884 | Surface and Coatings Technology | 2011 | 5 Pages |
Abstract
Surface treatment of insulator materials has growing needs recently. However, accumulation of charges on the insulator surface limits the applicability of plasma methods for the insulator processing. A radio-frequency-bias method is a good choice but it still has a problem coming from the oscillating sheath potential. In the present study, we are proposing the dual-plasma ion process, a new plasma process that enables for insulator samples to be treated by an energy-controlled, dc ion beam without surface charging. The concept and results of the proof-of-principle experiment are given.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Akihito kantani, Hiroki Sato, Yuya Nonaka, Naoyuki Sato, Takashi Ikehata,