Fluorine and carbon ion implantation and deposition on metals by plasma source ion implantation

Deposition of fluorine containing diamond-like carbon films is an effective solution for the improvement of machine parts in an aggressive aqueous environment when the combination of a hydrophobic surface with good corrosion protection and low friction coefficients is required. Stainless steel and silicon were treated by plasma source ion implantation using the gases CF4, C6F6 and C6H5F, in the latter case with previous methane implantation. Depending on the plasma gas there are differences in the fluorine content, depth distribution, film thickness, water contact angle and friction coefficient.

Research Highlights► Deposition of fluorine containing diamond-like carbon films. ► Preparation by plasma source ion implantation. ► Hydrophobic surface combined with corrosion protection and low friction coefficient. ► Properties depend on the preparation conditions, especially the plasma gas.