| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1658901 | Surface and Coatings Technology | 2011 | 4 Pages |
Because high density DLC (HD-DLC) films prepared using filtered arc deposition (FAD) systems possess high hardness, low friction coefficients, and a smooth surface, they have been good candidates for use in tribological applications. The aim of present work is the investigation of the mechanical and structural properties of HD-DLC films.The experimental conditions were the following: arc current, 50 A; base pressure, less than 3 × 10− 3 Pa; substrate bias, DC-100 V; substrate temperature, less than 100 °C. The HD-DLC films were formed on silicon wafers and tungsten carbide (WC) substrates. The film properties of hardness, composition, structure, and friction were analyzed.The film hardness is high, 80–90 GPa, with a low friction coefficient of less than 0.1.
