Article ID Journal Published Year Pages File Type
1660403 Surface and Coatings Technology 2009 5 Pages PDF
Abstract

Si-doped hydrogenated amorphous carbon (a-C:H:Si) film was prepared using hybrid radio frequency plasma-enhanced chemical vapor deposition (R.F. PECVD) and non-balanced magnetron sputtering deposition technique. The microstructure of the film was characterized by means of Raman spectrometry, X-ray photoelectron spectroscopy (XPS), and X-ray diffraction (XRD), while its friction behavior in water environment was investigated using a ball-on-disc tribometer. Results show that the a-C:H:Si film has typical diamond-like characteristics, and Si doped with a relative atomic concentration of about 3.9% in the film mainly exists in the form of Si, SiC, and SiO2, while it shows a superlow friction coefficient of about 0.005 in water environment when sliding against Si3N4 ball. The superlow friction behavior of the hybrid diamond-like-carbon (DLC) film could be attributed to the formation of a tribochemical reaction film and boundary lubrication layer mainly consisting of colloidal silica generated from tribochemical reactions between silicides and water molecules.

Related Topics
Physical Sciences and Engineering Materials Science Nanotechnology
Authors
, , , , , , , ,