Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1660494 | Surface and Coatings Technology | 2008 | 5 Pages |
Abstract
The structure and mechanical properties of nickel/hydrogenated amorphous carbon (Ni/a-C:H) films formed by microwave plasma-assisted deposition technique were investigated as a function of the carbon content using various methods: Rutherford backscattering spectroscopy (RBS), Raman spectroscopy and tribometry. The size of carbon clusters determined by Raman spectroscopy in Ni/a-C:H films deposited in gas mixtures containing 40 and 60% of C2H2, and in nickel free a-C:H films was 1 and 4 nm, respectively. However, the amorphous Ni/a-C:H films deposited from a gas mixture containing 60% of C2H2 exhibited the lowest friction coefficient (∼ 0.04), at the same time the nanohardness of these films was ∼ 7 GPa.
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Materials Science
Nanotechnology
Authors
Y. Pauleau, V.V. Uglov, A.K. Kuleshov, M.V. Astashynskaya, M.P. Samtsov, S.N. Dub,