Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1660550 | Surface and Coatings Technology | 2009 | 5 Pages |
Abstract
In this study, a relatively simple process is used to deposit a soft super-hydrophobic film using hexamethylcyclotrisiloxane as a precursor by dielectric barrier discharge-assisted chemical vapor deposition. The purpose of this study is to introduce a phenomenon of the creation of a double rough structure on a substrate. A maximum contact angle of approximately 162° was obtained and the film grew in the shape of a double roughness structure, similar to a lotus leaf, indicating a super-hydrophobic surface. The results of the aging test indicated that the as-grown super-hydrophobic surface was stable against moisture and was only dependent on the growing structure of films.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
M.C. Kim, C.-P. Klages,