| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1660799 | Surface and Coatings Technology | 2007 | 8 Pages |
Abstract
A new method called time-delayed, time-resolved Langmuir probe measurement is used to measure pulsed plasmas to overcome the secondary electron emission during high-voltage pulses. This method has been verified with a good agreement with an in-situ Faraday cup dosimetry technique. The plasma characteristics of the pulsed-mode, non-continuous plasma and continuous plasma with high-voltage pulses are measured and analyzed using this method. The continuous plasma with high-voltage pulses shows higher plasma densities, lower working pressure and pulse voltage, larger and more flexible process windows, and less charging effect.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Shu Qin, Allen McTeer,
