| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1660982 | Surface and Coatings Technology | 2008 | 5 Pages |
Abstract
The optical spectroscopy is an in situ diagnostics of plasma reactors allowing to control a given process of surface treatment, without plasma perturbation.It is presently reported the results obtained by Two photons Laser Induced Fluorescence (TALIF) and by emission spectroscopy in Ar-1.5% N2 and N2 microwave flowing afterglow to determine the N-atom density and to discuss the kinetics of N-atom recombination to produce the N2 (B3Πg,v′) radiative vibrational states via the N2 (5Σg+ and A3Σu+) intermediary potential curves.The N-atom transmission is checked through porous membranes.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
A. Ricard, F. Gaboriau, C. Canal,