| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1661158 | Surface and Coatings Technology | 2007 | 8 Pages |
Abstract
Carbon nitride films have been deposited by dielectric barrier discharge with a CH4/N2 gas mixture at different conditions. Fourier Transform Infrared (FTIR) spectroscopy, X-ray photo electron spectroscopy (XPS), Raman spectroscopy, Atomic force microscopy (AFM) and ellipsometry were used to systematically study chemical composition, bond structure and surface morphology of deposited films. Various bonds between carbon, nitrogen, hydrogen, and also oxygen were observed.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Abhijit Majumdar, Jan Schäfer, Puneet Mishra, Debabrata Ghose, Jürgen Meichsner, Rainer Hippler,