| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1661764 | Surface and Coatings Technology | 2008 | 6 Pages |
Abstract
The aim of this study was to investigate the influence of oxygen concentration in Ar/O2 gas mixture on the crystalline properties of TiO2 thin films obtained at low temperature by reactive magnetron sputtering technique. Mass spectrometry of plasma medium provides, in conjunction with XRD and AFM measurements, a guide for attainment of good quality anatase TiO2 films.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
H. Toku, R.S. Pessoa, H.S. Maciel, M. Massi, U.A. Mengui,