Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
166197 | Chinese Journal of Chemical Engineering | 2006 | 7 Pages |
Abstract
Simulations of heat transfer and oxygen transport during a Czochralski growth of silicon with and without a cusp magnetic field were carried out. A finite volume method with a low-Reynolds number K-ɛ model proposed by Jones-Launder was employed. The numerical results were compared with the experimental data in the literature. It is found that the calculated results are in good agreement with the experimental data.
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