Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1661971 | Surface and Coatings Technology | 2006 | 5 Pages |
Abstract
Hard, dense and conformal hafnium diboride (HfB2) thin films were obtained by CVD from the precursor Hf[BH4]4 at deposition temperatures ≤ 350 °C. As-deposited films were X-ray amorphous but transformed to a nanocrystalline structure after being annealed at 700 °C. Amorphous HfB2 films exhibited a respectable hardness of 20 GPa; the hardness increased in the nanocrystalline state to 40 GPa. Ternary Hf–B–N films, which consisted of a mixture of HfB2, HfN and BN were obtained by adding atomic nitrogen to the growth flux. The formation of the softer a-BN phase produced a drop in the hardness and modulus values. A multilayer HfB2/Hf–B–N exhibited a good combination of high hardness (33 GPa) and low elastic modulus (300 GPa).
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Authors
S. Jayaraman, J.E. Gerbi, Y. Yang, D.Y. Kim, A. Chatterjee, P. Bellon, G.S. Girolami, J.P. Chevalier, J.R. Abelson,