| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1662137 | Surface and Coatings Technology | 2006 | 6 Pages |
Abstract
Effects of mass analyzed low energy O2+ ion implantation in Al thin films on the hardening and microstrucure have been studied by nanoindenting atomic force microscopy (AFM). The fluence range was 1 × 1017–1 × 1018 O atoms/cm2. A maximum increase of hardness about 90% of the implanted samples is observed. Apparently there is no significant variation in the hardness values within the range of ion fluences investigated here. Finally, the surface roughness is found to decrease considerably by oxygen irradiation.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
P. Mishra, D. Ghose,