| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1662213 | Surface and Coatings Technology | 2006 | 6 Pages |
Abstract
The present paper deals with the characterization of plasma polymerized allylamine films. The films were characterized using a large panel of techniques such as Fourier transformation infrared spectroscopy, X-ray photoemission spectroscopy and ellipsometry. The film microstructure was investigated as a function of the deposition power while other process parameters (gas mixture flow, pressure) were kept constant. The microstructure shows a strong dependence on the deposition power. A power transition has been identified outlining two deposition modes in agreement with a growth model developed for carbon nitride thin films. Conditions of deposition closed to this transition provide a film microstructure interesting for absorption and adhesion of biomolecules i.e. high NH2 content, high porosity and high deposition rate.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Michaël Lejeune, Frédéric Brétagnol, Giacomo Ceccone, Pascal Colpo, François Rossi,