| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1662255 | Surface and Coatings Technology | 2007 | 4 Pages |
Abstract
The chemical vapor deposition (CVD) of thin TiO2 films was studied on the macroscale level using a computational fluid model. The deposition rate was established for various substrate temperatures, showing the transition from a surface reaction rate limited regime to a mass limited regime.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
E. Neyts, A. Bogaerts, M. De Meyer, S. Van Gils,