Article ID Journal Published Year Pages File Type
1662279 Surface and Coatings Technology 2007 5 Pages PDF
Abstract
In this paper we present the results of a combinatorial approach to Atmospheric Pressure Chemical Vapour Deposition. By using a modified reactor with multiple reagent entry points, and introducing reagents into the reactor through these asymmetrically, a compositional gradient across a deposited film can be formed. The technique will be demonstrated with examples of titanium and tungsten oxides. The rapid analytical method used, the second key step in a combinatorial synthesis, is micro-focus X-ray diffraction mapping, and this will also be discussed.
Related Topics
Physical Sciences and Engineering Materials Science Nanotechnology
Authors
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