Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1662279 | Surface and Coatings Technology | 2007 | 5 Pages |
Abstract
In this paper we present the results of a combinatorial approach to Atmospheric Pressure Chemical Vapour Deposition. By using a modified reactor with multiple reagent entry points, and introducing reagents into the reactor through these asymmetrically, a compositional gradient across a deposited film can be formed. The technique will be demonstrated with examples of titanium and tungsten oxides. The rapid analytical method used, the second key step in a combinatorial synthesis, is micro-focus X-ray diffraction mapping, and this will also be discussed.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Geoffrey Hyett, Ivan P. Parkin,