Article ID Journal Published Year Pages File Type
1662406 Surface and Coatings Technology 2007 9 Pages PDF
Abstract

In this research, a numerical simulation of the plasma-assisted CVD coating process for low-temperature deposition of a TiN layer using TDMAT: Tetrakis(dimethylamino)titanium was performed. Despite the tremendous demands for coated applications, most coating processes remain on a laboratory scale. To apply the results for a laboratory-size chamber to an industrial-size chamber, simulation studies were focused on a pilot plant as an intermediate step. On the whole, the tendency of deposition on a substrate was shown to be dependent on the process parameters of flow rate, heating temperature, pressure and process gas composition. The simulation technique would apply to an up-scaled industrial chamber.

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Physical Sciences and Engineering Materials Science Nanotechnology
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