Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1662406 | Surface and Coatings Technology | 2007 | 9 Pages |
Abstract
In this research, a numerical simulation of the plasma-assisted CVD coating process for low-temperature deposition of a TiN layer using TDMAT: Tetrakis(dimethylamino)titanium was performed. Despite the tremendous demands for coated applications, most coating processes remain on a laboratory scale. To apply the results for a laboratory-size chamber to an industrial-size chamber, simulation studies were focused on a pilot plant as an intermediate step. On the whole, the tendency of deposition on a substrate was shown to be dependent on the process parameters of flow rate, heating temperature, pressure and process gas composition. The simulation technique would apply to an up-scaled industrial chamber.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Seok-Jae Son, Kyung-Woo Yi, J. Mahrholz, K.-T. Rie,