| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1662432 | Surface and Coatings Technology | 2007 | 6 Pages |
Abstract
Electrochemical behavior of Ti-Al-Zr implanted with nickel and tantalum ions and a co-implantation of them was investigated as a function of fluences. The polarization curves of the un-implanted and implanted Ti-Al-Zr were potentiodynamically measured in a hydrochloric acid solution. Electrochemical measurements revealed that nickel ion implantation significantly promoted the passivation of Ti-Al-Zr with an increase of fluence and the corrosion potentials resided in the passive region at fluences above 1Â ÃÂ 1016 ions/cm2. Tantalum ion implantation was effective in reducing the anodic current densities in the active and passive regions as fluences increased. On the other hand, the polarization curves of the co-implanted Ti-Al-Zr exhibited more stable passive behavior with low current densities. It was concluded that an excellent corrosion resistance of Ti-Al-Zr was achieved by complementary effects of nickel and tantalum ions co-implantation.
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Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Y.Z. Liu, X.T. Zu, R. Tang, X. Xiang, L. Wang, W.G. Ma,