| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1662704 | Surface and Coatings Technology | 2006 | 7 Pages |
Abstract
Coatings of MoSi2–SiO2 with uniform thickness and excellent adhesion were successfully deposited onto molybdenum substrate via chemical vapor deposition (CVD) of SiCl4/H2 and the subsequent metal-organic chemical vapor deposition (MOCVD) of TEOS/N2 at relatively low temperatures. Preliminary isothermal and cyclic oxidation tests indicated that SiO2 coated samples did not further degrade the oxidation resistance of MoSi2. The composition and phases of the metal-disilicide and silica coatings were studied by X-ray diffraction and Auger electron spectroscopy. The surface microstructures were investigated with field emission scanning electron microscopy.
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Authors
Edward K. Nyutu, Michael A. Kmetz, Steven L. Suib,