Article ID Journal Published Year Pages File Type
1663524 Surface and Coatings Technology 2006 8 Pages PDF
Abstract
Thus far, no structure of this type was observed during the IPD processes. The mechanism of the layer growth is difficult to explain. It probably involves accumulation of heat, and thus it may be a result of layer recrystallization.
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Physical Sciences and Engineering Materials Science Nanotechnology
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Growth of nanopillar CNx layer during impulse plasma deposition
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