The crystallization and properties of sputter deposited lithium niobite

•Room temperature sputter deposition of crystalline lithium niobite (LiNbO2)•Contrast with previous high temperature corrosive growth methods•Analysis of sputter deposition parameters on the chemical and physical properties of the deposited material

Sputter deposition of the thin film memristor material, lithium niobite (LiNbO2) is performed by co-deposition from a lithium oxide (Li2O) and a niobium target. Crystalline films that are textured about the (101) orientation are produced under room temperature conditions. This material displays memristive hysteresis and exhibits XPS spectra similar to MBE and bulk grown LiNbO2. Various deposition parameters were investigated resulting in variations in the deposition rate, film crystallinity, oxygen to niobium ratio, and mean niobium oxidation state. The results of this study allow for the routine production of large area LiNbO2 films at low substrate temperature useful in hybrid-integration of memristor, optical, and energy storage applications.