Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1664157 | Thin Solid Films | 2016 | 4 Pages |
Abstract
•The etch pits formed by plasma etching on heteroepitaxial diamond have been clarified by TEM.•The origin of etch pit was mainly [001] threading dislocation.•These dislocations were identified as edge and 45° mixed type.•The correlation between dislocation types and etch pit shape
The classification of etch pits formed by hydrogen plasma etching on heteroepitaxial diamond has been done by cross-sectional transmission electron microscope (TEM). We demonstrated that the origin of etch pit was mainly [001] threading dislocation. From invisibility criterion of dislocation contrast in TEM observation, this dislocation was identified as edge and 45° mixed dislocation. The correlation between dislocation types and etch pit shape was discussed.
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Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
K. Ichikawa, H. Kodama, K. Suzuki, A. Sawabe,