Article ID Journal Published Year Pages File Type
1664157 Thin Solid Films 2016 4 Pages PDF
Abstract

•The etch pits formed by plasma etching on heteroepitaxial diamond have been clarified by TEM.•The origin of etch pit was mainly [001] threading dislocation.•These dislocations were identified as edge and 45° mixed type.•The correlation between dislocation types and etch pit shape

The classification of etch pits formed by hydrogen plasma etching on heteroepitaxial diamond has been done by cross-sectional transmission electron microscope (TEM). We demonstrated that the origin of etch pit was mainly [001] threading dislocation. From invisibility criterion of dislocation contrast in TEM observation, this dislocation was identified as edge and 45° mixed dislocation. The correlation between dislocation types and etch pit shape was discussed.

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Physical Sciences and Engineering Materials Science Nanotechnology
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