Characterisation of electrodeposited polycrystalline uranium dioxide thin films on nickel foil for industrial applications

•Electrodeposition of polycrystalline UO2 thin films•Tower-like morphology for 3D solar cell applications•Novel technique for separation of heavy elements from radioactive waste streams

Polycrystalline uranium dioxide thin films were grown on nickel substrates via aqueous electrodeposition of a precursor uranyl salt. The arising semiconducting uranium dioxide thin films exhibited a tower-like morphology, which may be suitable for future application in 3D solar cell applications. The thickness of the homogenous, tower-like films reached 350 nm. Longer deposition times led to the formation of thicker (up to 1.5 μm) and highly porous films.