Article ID Journal Published Year Pages File Type
1664243 Thin Solid Films 2015 6 Pages PDF
Abstract
The ZnO photoelectrodes prepared by both methods were investigated from morphostructural point of view. The optimum parameters of the films deposited by laser ablation which to correspond to the best efficiency of the cells were: 450 mTorr oxygen pressure, with 5.83 μm film thickness, delivering 580 mV open circuit voltage (Voc), 1.16 mA/cm2 short circuit current density (Jsc), 33% fill factor (FF), 0.22% conversion efficiency (ƞ). Concerning the ZnO photoelectrodes deposited by doctor blade method, almost a double value for ƞ was obtained of 0.43%, 25 μm film thickness, 483 mV Voc, 2.52 mA/cm2 and 36% (FF).
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Physical Sciences and Engineering Materials Science Nanotechnology
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