Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1664455 | Thin Solid Films | 2016 | 20 Pages |
Abstract
Recently, non-equilibrium atmospheric pressure plasma, especially those operated at low gas temperatures, have become a topic of great interest for the processing of flexible and printed electronic devices due to several benefits such as the reduction of process and reactor costs, the employment of easy-to-handle apparatuses and the easier integration into continuous production lines. In this review, several types of typical atmospheric pressure plasma sources have been addressed, and the processes including surface treatment, texturing and sintering for application to flexible and printed electronic devices have been discussed.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Kyong Nam Kim, Seung Min Lee, Anurag Mishra, Geun Young Yeom,