| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1664655 | Thin Solid Films | 2015 | 8 Pages |
Abstract
A PECVD (Plasma-enhanced Chemical Vapor Deposition) process operating at 150 °C has been implemented to prepare micro-columnar porous TiO2 anatase thin films, performing post-annealing at 300 °C for 5 h. Optimized PECVD conditions have enabled us to obtain homogeneous films with thickness equal to 1-2 μm ± 0.2 μm. An anatase seeding interface deposited prior to the PECVD process has enabled us to reduce crystallization time down to 1.5 h. The size of nano-crystals in prepared anatase thin films has been estimated to be 20 nm by applying the Scherrer equation. Besides, the band-gap energy (Eg) of synthesized anatase thin films on quartz was found to be 3.30 eV.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Ming Zhou, Stéphanie Roualdès, Jie Zhao, Vincent Autès, André Ayral,