Article ID Journal Published Year Pages File Type
1664890 Thin Solid Films 2015 9 Pages PDF
Abstract
Tungsten thin films have exceptional thermal and mechanical properties, compared to other pure metal coatings, making them indispensable in many contemporary high-tech applications. Their superior properties, however, are strongly dependent on film microstructure, specifically including comprising phases, and hence, the employed deposition parameters, making a thorough process control essential. This study therefore investigates the different material properties of the bcc α and the A15 β phase of tungsten with respect to process parameters. The formation of β-W is mainly dependent on process gas pressure. While all films deposited at elevated pressure consist of β-W, the onset of β formation can already be observed for low pressure deposition, if magnetron power is reduced sufficiently. However, β-W formation for all deposition pressures can be suppressed by applying a substrate bias during deposition, leading to an α-W configuration. This indicates that the alpha-to-beta transition during film growth predominantly depends on adatom energy, rather than solely on the inclusion of residual impurities. Simultaneously, mechanical and electrical performance could be improved, while maintaining a nanocrystalline microstructure.
Related Topics
Physical Sciences and Engineering Materials Science Nanotechnology
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