Article ID Journal Published Year Pages File Type
1665049 Thin Solid Films 2014 6 Pages PDF
Abstract

•Cu and Ti doped bismuth vanadate films were prepared by aerosol deposition (AD).•Dense 3–5 μm thick films were deposited on alumina, silicon and gold electrodes.•Annealing of the AD-layer increases the conductivity by 1.5 orders of magnitude.•Effect of temperature on structure and microstructure was investigated.

Bismuth vanadate, Bi4V2O11, and related compounds with various metal (Me) substitutions, Bi4(MexV1−x)2O11−δ, show some of the highest ionic conductivities among the known solid oxide electrolytes. Films of Cu and Ti substituted bismuth vanadate were prepared by an aerosol deposition method, a spray coating process also described as room temperature impact consolidation. Resultant films, several microns in thickness, were dense with good adhesion to the substrate. Scanning electron microscopy and high temperature X-ray diffraction were used to monitor the effects of temperature on the structure and microstructure of the film. The particle size remained nano-scale while microstrain decreased rapidly up to 500 °C, above which coarsening and texturing increased rapidly. Impedance measurements of films deposited on inter-digital electrodes revealed an annealing effect on the ionic conductivity, with the conductivity exceeding that of a screen printed film, and approaching that of bulk ceramic.

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Physical Sciences and Engineering Materials Science Nanotechnology
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