Microstructural characterisation of tungsten coatings deposited using plasma sputtering on Si substrates

Nanostructured W thin films synthesized by RF Plasma system have been characterized. These coatings may have appeal for functional applications, e.g. in corrosion resistance and barrier film. The role of the some process parameters, like pressure and sputter gas, has been investigated. We have shown that the microstructure (α and β-W phase) can be tuned as a function of the sputter gas and substrate pretreatment.