Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1665872 | Thin Solid Films | 2013 | 6 Pages |
Abstract
We report the characterization of photo-crosslinked polyvinylidene fluoride-co-hexafluoropropylene (PVDF-HFP) thin film, metal-insulator-metal capacitors fabricated using standard semiconductor processing techniques. We characterize the capacitors using in-situ vibrational spectroscopy during thermally-assisted poling and correlate the Fourier transform infrared spectroscopy (FTIR) results with X-ray diffraction (XRD) results. FTIR analysis of the neat PVDF-HFP showed α â β transformations during poling at room temperature and at 55 °C. α â β transformations were observed for the crosslinked polymer only during poling at 55 °C. XRD data revealed that photo-crosslinking caused the polymer to partially crystallize into the β-phase. The similar behavior of the neat and crosslinked samples at 55 °C suggests that a higher activation energy was needed for α â β transformations in crosslinked PVDF-HFP during poling. Electrical measurements showed that photo-crosslinking had no significant effect on the dielectric constant and dielectric loss of PVDF-HFP. However, the dielectric strength and maximum energy density of the crosslinked polymer were severely reduced.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
O.D. Iyore, K. Roodenko, P.S. Winkler, J.R. Noriega, J.J. Vasselli, Y.J. Chabal, B.E. Gnade,