Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1665903 | Thin Solid Films | 2013 | 5 Pages |
•The effect of balanced power feeding on very high frequency plasma was examined by simulation.•Electron density inside the electrodes increased by the balanced power feeding.•Electron density outside the electrodes decreased significantly.•Suppression effect on electron density was more effective at high gas pressure.•Input power was efficiently absorbed inside the electrodes.
The effects of a balanced power feeding (BPF) method on a very high frequency hydrogen plasma produced with narrow-gap parallel plate electrodes are studied by 2-dimensional simulation. It was found that the electron density increases inside the electrodes and decreases outside the electrodes. The input power was effectively absorbed into the intermediate region of the electrodes. In addition, the electron density outside the electrodes decreased with increasing the gas pressure, and the electron density inside the electrodes peaked at a certain pressure. The property of the power absorption was improved and the electron temperature decreased for the higher gas pressure in the BPF model.