Atomic layer deposition of high-k dielectrics on carbon nanoparticles

Carbon nanoparticles were synthesized from 5-methylresorcinol and formaldehyde via base catalysed polycondensation reaction and distributed over silicon oxide wafers and aluminium oxide thin films. These particles essentially possessed monocrystalline graphite structure. The particles were covered by hafnium oxide thin films in metal chloride based atomic layer deposition process carried out at 300 °C. Upon deposition of HfO2, thin crystalline metal oxide layer containing mostly cubic phase was formed. At the same time, deposition of the metal oxide caused reduction of the sizes of graphite particles and essential increase in the disorder in carbon.

► Carbon nanoparticles were synthesized via base catalysed synthesis in aqueous media ► Conformal HfO2 films were grown by atomic layer deposition on carbon particles. ► Growth of HfO2 caused structural modification of graphite-like carbon