| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1666619 | Thin Solid Films | 2012 | 8 Pages |
Abstract
⺠Thin film deposition by aerosol assisted chemical vapor deposition (AA-CVD) ⺠Yttria stabilized zirconia (YSZ) thin films deposited between 300 °C and 600 °C ⺠Water decreases growth rates and leads to crack formation in AA-CVD of YSZ. ⺠Crack-free YSZ thin films deposited using oxygen and/or nitrogen as carrier gas ⺠YSZ thin films deposited by AA-CVD show low shrinkage on annealing at 1000 °C.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
M.V.F. Schlupp, S. Binder, J. Martynczuk, M. Prestat, L.J. Gauckler,