| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1666629 | Thin Solid Films | 2012 | 8 Pages |
Abstract
⺠150 nm zirconium films on silicon were anodised to form thin zirconia film. ⺠Crystalline ZrO2 films formed with predominantly tetragonal or cubic phases. ⺠Duplex ZrO2 layer with tetragonal or cubic oxide near the oxide/substrate interface.
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Authors
Zainovia Lockman, N.R.Z. Abidin, S. Ismail, K.Y. Cheong, Z. Hassan,