Article ID Journal Published Year Pages File Type
1666651 Thin Solid Films 2012 7 Pages PDF
Abstract

This paper reports on an original and simple two step process of nickel oxide layer reduction and rapid self-assembling of n-dodecanethiol on nickel surfaces. Chemical reduction of the oxide layer present on polycrystalline nickel surface using hydrazine monohydrate in alkaline media is very fast and facilitates the formation of a dense self-assembled monolayer of thiol from its ethanol solution within six hours. The developed method is simple and the resulting monolayer prevents the nickel surface oxidation when exposed to atmospheric conditions.

► A two step process was developed to form n-dodecanethiol monolayers on nickel. ► Nickel oxide layer was reduced using alkaline hydrazine monohydrate solution. ► n-Dodecanethiol monolayer was formed in six hours on chemically reduced nickel. ► The applied treatment prevents nickel oxide layer formation. ► Electrochemical results are consistent with the presence of nickel sulfide adlayer.

Related Topics
Physical Sciences and Engineering Materials Science Nanotechnology
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