| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1666664 | Thin Solid Films | 2012 | 4 Pages |
Abstract
⺠Boron doped emitters with a large range of surface doping concentrations were made. ⺠Plasma-enhanced chemical-vapor-deposited AlOx is used for the passivation. ⺠Very low emitter saturation current density (5.2-38 fA cmâ 2) was obtained. ⺠The surface recombination velocity was evaluated using simulation.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Pierre Saint-Cast, Armin Richter, Etienne Billot, Marc Hofmann, Jan Benick, Jochen Rentsch, Ralf Preu, Stefan W. Glunz,